High-purity nitrogen and oxygen systems for semiconductor manufacturing
Semiconductor, display and electronics manufacturing need nitrogen at 4N to 6N purity, delivered continuously and measured in ppm and ppb. We supply cryogenic nitrogen plants, on-site gas systems and high-purity oxygen for wafer cleaning, carrier gas, furnace atmosphere, purging, CVD/PVD processes and electronic specialty gas production.
Purity defined as impurity limits, not just a percentage
At 99.9999% the specification reads as oxygen, moisture, CO and total hydrocarbon limits in ppb — each of which drives plant design and analyser selection.
02
Continuity above price per Nm³
An interruption in nitrogen supply stops a fab line, so availability, redundant purification and liquid backup are evaluated before specific power.
03
Load following
Gas demand tracks production shifts and tool loading, so the plant must hold purity across a wide turn-down range, not only at design point.
04
Clean, documented delivery
Material certificates, welding records, passivation and internal cleanliness all fall within the buyer's quality audit.
05
Oxygen for oxidation processes
High-purity oxygen at 99.999% is required for oxidation, ozone generation and some specialty gas processes.
TYPICAL REQUIREMENTS
Typical process requirements
Nitrogen purity
Additional purification stage, tighter column control
99.999% – 99.9999% (4N – 6N)
Residual oxygen
Analyser selection and sample conditioning
ppm to sub-ppm
Moisture / dew point
Molecular sieve cycle control, leak-tight construction
ppb to low ppm
Flow
Turn-down range, buffer storage, load control
Hundreds to several thousand Nm³/h
Discharge pressure
Internal or external compression
0.5 – 2.0 MPa(G) typical
Backup
LIN column, cryogenic tank and pump
Liquid nitrogen storage and vaporiser
Operating hours
Reliability-centred equipment selection
≥8,000 h/y, essentially continuous
Quality documentation
Workshop QC and traceability
Material and test certificates, weld records
RECOMMENDED CONFIGURATION
Recommended configuration
How we would configure the plant for this duty.
Cryogenic nitrogen plant
For flows from about 1,000 Nm³/h upward and 5N or better, a cryogenic plant is normally the lower cost of ownership: separation cost per Nm³ stays flat as purity increases, unlike PSA.
Purification and trace analysis
Additional adsorption stage where 6N or better is required, with continuous trace oxygen and moisture analysers and validated calibration.
Liquid nitrogen backup
LIN column, cryogenic storage and vaporiser sized to the critical load, so a plant stop or power interruption does not stop the line.
Oxygen supply
High-purity oxygen up to 99.999% from the oxygen column of the same cold box or from liquid oxygen storage, with oil-free design throughout.
Redundancy and control
Spared rotating equipment, redundant purification and DCS control with independent safety interlocks for uninterrupted supply.
Modular shipment
Workshop assembly and function testing of cold box and skids to shorten the construction programme.
Because the cost per Nm³ stays almost flat as purity increases, whereas PSA needs large beds and high power to reach the same purity — and purity stability is easier to hold at high flow.
With on-line trace analysers for oxygen, moisture and hydrocarbons, sample conditioning units and a documented calibration procedure, verified at the performance test.
Liquid nitrogen storage with automatic vaporisation keeps the fab supplied while the plant restarts; storage size follows the agreed acceptable interruption time.
Yes. A combined cold box produces both products, and argon where the site justifies recovery, sharing compression and refrigeration.
START WITH YOUR PROCESS
Send us your impurity specification.
Nitrogen and oxygen flow, impurity limits in ppm or ppb, discharge pressure, backup requirement and site conditions are enough for a preliminary configuration.